Titanium Target

Purity: However, in practical applications, the purity requirements for target materials also vary. For instance, with the rapid development of the microelectronics industry, the size of silicon wafers has evolved from 6 "and 8" to 12 ", while the width of wiring has decreased from 0.5um to 0.25um,0.18um and even 0.13um. Previously, a target material purity of 99.995% could meet the process requirements of 0.35um ics. The purity of the target material required for the preparation of 0.18um lines is 99.999% or even 99.9999%.

Impurity content: Impurities in the solid target material and oxygen and water vapor in the pores are the main sources of contamination for the deposited film. The requirements for different impurity contents of target materials for different uses also vary. For instance, pure aluminum and aluminum alloy targets used in the semiconductor industry have special requirements for the content of alkali metals and radioactive elements.

Density: To reduce the porosity in the solid target material and enhance the performance of the sputtered film, it is usually required that the target material have a relatively high density. The density of the target material not only affects the sputtering rate, but also influences the electrical and optical properties of the film. The higher the density of the target material, the better the performance of the film. In addition, increasing the density and strength of the target material enables it to better withstand the thermal stress during the sputtering process. Density is also one of the key performance indicators of target materials.

Grain size and grain size distribution: Usually, the target material has a polycrystalline structure, and the grain size can range from micrometers to millimeters. For the same target material, the sputtering rate of a target with fine grains is faster than that of a target with coarse grains. The thickness distribution of the films deposited by target sputtering with smaller grain size differences (uniform distribution) is more uniform.

We offer standard titanium targets in a variety of standard diameters and dimensions, with custom sizes available on request. Below are the dimensions we provide:

1.Circular Targets

Diameter: 1 inch (25.4 mm)- 10 inches (254 mm)

2.Rectangular Targets

• 100 mm x 50 mm
• 150 mm x 75 mm
• 200 mm x 100 mm
• 300 mm x 150 mm
• 400 mm x 200 mm
• Thickness Options:
• 0.125 inches (3.175 mm)
• 0.250 inches (6.35 mm)
• 0.375 inches (9.525 mm)
• 0.500 inches (12.7 mm)

Other than the above specifications, we can custom create alternative solutions for any specific requirements not mentioned here.