Tantalum Protective Tubes

In semiconductor wafer epitaxial growth (MOCVD/PECVD), ultra-high vacuum high temperature furnace and modern pharmaceutical fluid control, ordinary alloy pipes often undergo deformation or microscopic grain boundary fracture within hundreds of hours due to high temperature thermal stress or strong acid corrosion.
In 2026, our precision grooved and porous customized tantalum pipes (Engineered Tantalum Sleeves with Precision Slots) are becoming the core standard parts in the vacuum cavities of top scientific research institutions and industrial semiconductor giants in North America and Europe by using 99.95% electronic grade high-purity tantalum billets, combined with advanced cold drawing and high-precision CNC/laser stress-free cutting technology. Its unique buckle and runner design perfectly solves the problem of heat and airflow uniformity under extreme thermal cycles.
I. Core Technology Advantages (Elite Engineering Advantages)
Seamless Body & Stress-Free Micro-Slotting: The precision slots and circular holes shown in the picture are all completed by high-precision machining or laser ablation technology at constant temperature. This process completely avoids microscopic burrs and edge residual stresses caused by processing, and prevents the pipe from bending or cracking during the thermal cycle of 1200 °C-1600 °C.
Near-Zero Outgassing in UHV under ultra-high vacuum (UHV): After deep high-vacuum high-temperature annealing treatment, the residual gas (hydrogen, oxygen, nitrogen) in the gap inside the tube wall is blocked, and the gas output rate reaches the international level Semiconductor-level compliance standards ensure that epitaxial wafers or high-purity vacuum thermal fields are not polluted.
Platinum-Like Chemical Inertness (Platinum-Like Chemical Inertness): Tantalum shows complete inert to almost all strong acids and reactive gases, including aqua king, hydrochloric acid, sulfuric acid, and nitric acid below 150 °C, and is the only solution for high-temperature acidic fluid conduction.
II. Basic Parameters and Technical Specifications (Technical Parameter Matrix)
|
Parameter |
Specification Range & Specifications Standard |
|
Grade |
(Grade) R05200 (pure tantalum/Unalloyed Tantalum)/R05400 (smelted tantalum/Vacuum-Arc Cast) |
|
Chemical Purity |
≥ 99.95% (3N5)/customizable ≥ 99.99% (4N semiconductor grade) |
|
Product Type |
Seamless Custom Machined Tube (Seamless Custom Machined Tube) |
|
Follow the international Standards |
ASTM B521 (Seamless and Welded Tantalum Pipe Standard)/ASTM B365 (Tantalum Rod Machined Parts Standard) |
|
OD Range |
φ 3.0 mm-φ 120 mm (the picture shows about a micro-diameter precision tube) |
|
Wall Thickness Range |
0.2 mm-5.0 mm (precision thin wall control tolerance up to ± 0. 02 mm) |
|
Slot/Hole Tolerance |
± 0. 01 mm (Grade CNC fineness) |
|
Surface Finish |
Pickled & Bright Annealed, Ra ≤ 0.8 um |
III. Strict chemical composition control (Chemical Profile Weight%)
We strictly implement the ASTM B521 electronic-grade low-gap element standard, and ensure the ductility and welding deformation resistance of pipe fittings by accurately controlling impurities such as carbon and oxygen:
Ta (tantalum purity): ≥ 99. 95%
O (oxygen): ≤ 0. 015% N (nitrogen): ≤ 0. 010% H (hydrogen): ≤ 0. 0015%
C (carbon): ≤ 0. 010% Fe (iron): ≤ 0. 010 Nb (niobium impurity): ≤ 0. 050%
IV. Advanced Processing Flow
EB smelting of high-purity ingots: high-vacuum electron beam (EB) remelting is used to cast high-purity tantalum ingots with ultra-low gas inclusions.
Multi-pass cold drawing and intermediate vacuum annealing: seamless thin pipes are drawn by precision moulds for many times, and supercrystalline annealing in the middle 10-4Pa vacuum furnace eliminates work hardening.
Precision CNC/laser topology grooving: According to the drawings, precision punching, grooving, and notching of the tube body (as shown in the figure with multi-position combined blind holes and long grooves).
Chemical pickling and ultrasonic cleaning packaging: use high-purity mixed acid to remove residues, carry out ultrasonic degreasing and drying in a 10,000-level ultra-clean room, and double-layer vacuum packaging to prevent oxidation and fingerprint pollution during overseas transportation.
V. Cross-border cutting-edge applications (Frontier Applications)
Semiconductor and CVD/Atomic Layer Deposition (ALD) process: In the corrosive precursor gas flow channel, it is used as a spray pipe or protective sleeve that can resist the erosion of high-temperature reactive gases.
Thermocouple Protection Sleeves: Protect noble metal thermocouples such as platinum and rhodium from erosion in vacuum induction furnaces or reduction furnaces above 1200 °C.
Pharmaceutical and fine chemical fluid chips: microinjection needles, capillary fluid tubes and buckle joints for the synthesis of strong acid compounds.

Monica
Position:Sales Manager
WhatsApp: +86 182 9270 2722
E-mail: Cr-Re@titanmsgp.com
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