Annealed Pure Niobium Disc

The vast majority of suppliers describe "annealed temper" simply as "stress-relieved and softened." But for engineers in precision optical thin-film and semiconductor thin-film deposition, what they are actually purchasing is not a "soft" niobium disc-it is a predictable, zero-variable interference evaporation/sputtering source.

Annealed pure niobium discs play an extremely sensitive role in vacuum coating processes. When a high-energy electron beam strikes the niobium disc surface, if the material contains cold-work residual texture or localized stress concentration, heat conduction becomes highly non-uniform. This causes localized instantaneous superheating and vaporization, producing spatter that forms fatal pitting and particulate defects on optical lenses or wafers. Our annealed pure niobium discs undergo vacuum high-temperature recrystallization annealing-the core purpose is not merely to reduce hardness, but to completely transform the cold-rolled fibrous structure into uniform equiaxed grains through full recrystallization.

This homogenization of microstructure directly delivers macroscopic process stability. Isotropic thermal conductivity is achieved: heat diffuses uniformly during e-beam scanning, the evaporation rate curve is smooth, and operators need not frequently adjust beam current to compensate for rate fluctuations-critical for yield control on continuous production lines. Ultra-low gas content is an invisible specification of this product. Niobium readily adsorbs oxygen, nitrogen, and hydrogen at room temperature; if the annealing vacuum is insufficient or the cooling stage is poorly controlled, the disc will contain excessive dissolved interstitial atoms. In the high-temperature vacuum environment of coating, these gases release instantaneously, disrupting chamber vacuum and directly causing film color shift or refractive index drift. Through high-vacuum degassing annealing, we keep oxygen content below 50 ppm, ensuring minimal outgassing during evaporation and maintaining process chamber cleanliness.

For magnetron sputtering customers, the surface condition of the disc determines the arcing rate. Micro roll marks or residual oxide scale on ordinary rolled sheet become charge accumulation points in the plasma environment, inducing abnormal arcing that damages the target surface or even penetrates the power supply. Our discs undergo vacuum bright annealing combined with precision polishing, removing not only the surface Nb₂O₅ layer but also controlling roughness to within Ra 0.4-significantly reducing arc probability, extending target service life, and ensuring deposited film thickness uniformity. In short, this product solves not the question of "whether niobium is present," but the fundamental materials-science question of "why coating yield won't improve."

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How To Cooperate With Us?

Name

Lisa

Phone Number

(86)-18291772322

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Ta-Nb@titanmsgp.com

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