Molybdenum rods for the semiconductor industry
Products Features
We firmly position our products in the field of semiconductor crystal growth, ion implantation, and thin film deposition equipment, mainly serving users of monocrystalline silicon furnaces, sapphire furnaces, ion implanters, and vacuum coating equipment. Different from ordinary industrial molybdenum materials, we insist on supplying semiconductor-grade high-purity molybdenum rods, the purity is stable at more than 99.95%, some batches can reach higher standards, and the impurity content is strictly controlled at an extremely low level. Born for a production line with zero tolerance for particle size and metal pollution.
Whether it is crystal drawing or the ion bombardment process, what users are most afraid of is material volatilization or gas release to pollute the cavity. We regard "low vapor pressure and high compactness" as the core selling point, making molybdenum rods truly a reliable structural support and functional component in equipment, helping chip factories improve yield and maintenance frequency.
Extremely high purity and low impurities
effectively avoid metal ions from polluting wafers and ensure stable electrical performance.
Excellent high temperature stability
the melting point is as high as 2620 °C, and the crystal growth at 1400-1600 °C can still have good strength and creep resistance, and the size changes very little.
Low heat and high thermal conductivity
Allow thermal coefficient, can withstand rapid rising and cooling cycles without deformation; Good thermal conductivity, helps equipment quickly achieve thermal balance, and thermal stress.

The superposition of these characteristics makes molybdenum rods still "resistant" under repeated thermal cycles and ion bombardment, far exceeding the performance of conventional metals.
Products Parameter
| Property | High Purity Mo Rod | TZM Alloy Rod | Mo-La Alloy Rod |
| Purity Level | ≥99.95% | High | High |
| Max Working Temperature | Up to 1600°C+ | Higher strength | Excellent stability |
| Thermal Expansion | Very Low | Low | Lowest |
| Vacuum Outgassing | Excellent | Good | Superior |
| Best Use Case | Crystal growth & fixtures | High-load components | High-temp vacuum parts |
Application Advantages
Single-crystal growth furnace
As a support rod for heating elements, thermal field components, and crucible brackets, it is used for the drawing process of semiconductor crystals such as silicon and sapphire. Stable high temperature directly affects crystal and diameter control.
Ion implantation equipment
make ion beam wire components, shields, and fixed structures, and use their bombardment resistance and low pollution characteristics to ensure accurate ion beam projection.
Thin film deposition and sputtering system
As a base, clamp, or auxiliary electrode component, it supports the uniform deposition of the metal layer and barrier layer.
Products Description

What do you get by choosing us?
Many fabs have reported that after using high-consistency molybdenum rods, the equipment maintenance cycle has been significantly extended, and the crystal defect rate has also decreased, which indirectly improves the overall output efficiency.
The semiconductor industry is moving towards smaller processes and stronger performance, and the stability of every key component is crucial. A reliable high-purity molybdenum rod may seem to be a small investment, but it can bring real cost savings and yield improvements in operation.
After-Sales Service
If your equipment is facing unstable thermal fields, pollution control problems, or needs to customize special-sized molybdenum parts, please feel free to contact us. We provide one-stop support from material selection advice to precision machining to help you truly realize the potential of your equipment.
To make every crystal growth more stable and every chip more reliable, this is our original intention of polishing molybdenum rods.
Ava
18291778622

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